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Abstract
As the complexity of VLSI design and manufacturing process
increases rapidly, importance of manufacturing test
becomes more critical. The main requirements of an effective
Manufacturing Test methodology are, support for detection
of all kind of manufacturing defects, minimal hardware
overhead and minimum test execution time. In the current
deep sub-micron era, smaller geometry and high density
of transistors creates new kind of faults which demands
for fundamental change in test methodology and fault
models. Conventional test methods do not address these
requirements well. Advances in EDA technology as well
as architectural and design level considerations, and
innovative way of implementation are the need of the
day.
This paper covers a brief on conventional test methods,
their limitations, and the need for new kind of test
methodology. It discusses the limitations of Automatic
Test Equipment as well as the need for BIST architectures
. Finally it discuss about the need and the power of
innovative Hybrid-Test Methodology and Hybrid Test Architecture
to overcome the problems of Deep Sub micron Devices
Authors
Sanjay JK
Sabeesh Balagangadharan
Rajin Ravimony
Sasitharan M
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